Effect of Input Power on the Deposition of Optical Grade Thick Diamond Film in a DCPJ CVD Jet System

摘要：

High quality optical grade thick diamond film wafers with different thickness are prepared by high power DC arc plasma jet CVD (DCP.I CVD) method using a CH4/Ar/H2 gas mixture. Three different powers, 13.65, 15.40 and 17.94kW, were employed during the investigation. The aim was to investigate the effect of these powers on the deposition of thick diamond film. The controlled system was discussed together. The results show that the average diamond grain size and growth rate increase with input plasma power, but a further increase in input power, diamond thick-film defects and amorphous carbon content increased.

关键词： input power thick diamond film CVD thick diamond film

作者: R.F.Chen Z.X.Shen L.G.Dai X.L.Zhang R.Zhu D.W.Zuo

作者单位: Department of Mechanical Engineering,Yangzhou University,Yangzhou,225009,China Department of Mechanical and Electrical Engineering,Nanjing University of Aeronautics and Astronauti

会议类型: 国际会议

会议名称: The 3rd Conference of Cross-Strait Engineering Education and Ceeusro & 1st International Conference on Engineering Technologies and Ceeusro(ICETC2009)(第三届工程技术与产学研研讨会暨第一届国际功能制造技术学术会议)

会议地点: 常州

会议语种:英文

页码: 245-248

在线出版日期: 2009-11-19（万方平台首次上网日期，不代表论文的发表时间）