The Deep Etching Process Based on Parallel Laser Direct Writing System

摘要：

Due to the high cost-effectiveness, extra flexibility, and short production cycle, laser direct writing system as a kind of maskless lithography technology has been widely used in the fields of micro-nano-manufacturing. The working principle of the parallel laser direct writing system based on DMD(Digital Micromirror Device) is introduced. A novel negative photoresist - dry film photoresist is adopted into the study of deep etching for the fabrication of the micro mold. The experimental results show that: the whole process is convenient, efficient and flexible; the precision of the 2-D patterning and the depth of etching is reliable.

关键词： Parallel laser direct writing Maskless lithography Deep lithography Dry film photoresist

作者: J.Hu D.L.Pu L.S.Chen

作者单位: Institute of Information Optical Engineering,Soochew University,Suzhou,Jiangsu,215006,China SVG Optronics Co.,Ltd,Suzhou industrial Park,Jiangsu,215026,China

会议类型: 国际会议

会议名称: The 3rd Conference of Cross-Strait Engineering Education and Ceeusro & 1st International Conference on Engineering Technologies and Ceeusro(ICETC2009)(第三届工程技术与产学研研讨会暨第一届国际功能制造技术学术会议)

会议地点: 常州

会议语种:英文

页码: 265-269

在线出版日期: 2009-11-19（万方平台首次上网日期，不代表论文的发表时间）