Nitrogen plasma enhanced quantum well intermixing in InGaAsP/InP laser structure
Experimental results on a new method of plasma enhanced quantum well intermixing is presented. Using nitrogen plasma treatment followed by rapid thermal annealing, a 100nm-blueshift of photoluminescence peak is obtained. The new method has much weaker side-effect of etching than previously reported method using Argon plasma.
(130.3120) Integrated optics devices (250.3140) Integrated optoelectronic circuits
Shenghua Peng Xin Zhang Jian-Jun He
Center for Integrated Optoelectronics, State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Hangzhou, PR China, 310027
国际会议
上海
英文
1-2
2009-11-01(万方平台首次上网日期,不代表论文的发表时间)