ZnO films growth at different temperature on the substrate of Corning glass by MOCVD

摘要：

We deposited ZnO films on Coming glass substrate by metal-organic chemical vapor deposition (MOCVD). We found the diffraction (002) peak at～34.46°, indicating that the ZnO thin films were C-oriented. ZnO films were highly transparent with a transmission ratio larger than 85％ in the visible range. The surface morphology of the films was observed by atomic force microscopy (AFM).

关键词： ZnO Thin Films Growth Glass MOCVD

作者: W. Tang J. Sun G. Du X. Yang C. Wang J.Zhao X. Gao J. Yang B. Liu H.Liang J. Zhao

作者单位: Jilin Institute of Architecture and Civil Engineering, Hongqi Street 1129＃, Changchun City, Jilin Pr Dalian University of Technology, China Jilin Institute of Architecture and Civil Engineering, Hongqi Street 1129#, Changchun City, Jilin Pr Northwestem University, USA

会议类型: 国际会议

会议名称: 2009 International Symposium on Liquid Crystal Science and Technology(2009国际液晶科技研讨会)

会议地点: 昆明

会议语种:英文

页码: 447-449

在线出版日期: 2009-08-02（万方平台首次上网日期，不代表论文的发表时间）