Growth of ZnO films under different oxygen partial pressures by metal organic chemical vapour deposition

摘要：

ZnO films were grown under different oxygen partial pressures by metal organic chemical vapor deposition on the substrates of Coming glass. We investigated the quality of the films by SIEMENS D8 X-ray diffractometer. The surface morphology of the films were observed by Digital Nanoscope шa AFM with normal silicon nitride tip in the contact mode. The hall effect measurements were carried out with indium ohmic contact. The transmission spectrum of the films were measured. The transmission ratio is larger than 80％ in the region above the wavelength of 385nm, and sharply decreased under 10％ below the wavelength of 375 nm.

关键词： Ba ZnO Thin Films Growth Glass MOCVD

作者: C. Wang J. Sun G. Du X. Yang B. Liu C. Zhao W. Tang J.Yang X.Gao H. Liang J. Zhao

作者单位: Jilin Institute of Architecture and Civil Engineering, Hongqi Street 1129＃, Changchun City, Jilin Pr Dalian University of Technology, China Jilin Institute of Architecture and Civil Engineering, Hongqi Street 1129#, Changchun City, Jilin Pr Northwestern University, USA

会议类型: 国际会议

会议名称: 2009 International Symposium on Liquid Crystal Science and Technology(2009国际液晶科技研讨会)

会议地点: 昆明

会议语种:英文

页码: 458-461

在线出版日期: 2009-08-02（万方平台首次上网日期，不代表论文的发表时间）