Self-similarity of electrochemically-deposited copper films on porous silicon

摘要：

The microstructures of electrochemically-deposited copper control electrode on semiconducting porous silicon films were investigated with scanning electron microscopy. Our results showed that smooth control electrode could be grown in areas far from the edge of porous silicon film while irregular electrode was formed on the circular edge of porous silicon films. The self-similarity of the electrochemically-deposited copper control electrode was analyzed in details.

关键词： Self-similarity Porous silicon Electrochemical deposition Simulation

作者: Lan-li Chen Bao-gai Zhai Yuan Ming Huang

作者单位: Department of Electronics, Nanyang Institute of Technology, Henan 473004, China Modern Educational Technology Center, Yunnan Normal University, Yunnan 650092, China College of Physics & Electronic Information, Yunnan Normal University, Yunnan 650092, China

会议类型: 国际会议

会议名称: 2009 International Symposium on Liquid Crystal Science and Technology(2009国际液晶科技研讨会)

会议地点: 昆明

会议语种:英文

页码: 515-518

在线出版日期: 2009-08-02（万方平台首次上网日期，不代表论文的发表时间）