Study of Methozyphenylquinozalines (MOPQs) as Photoinitiators in the Negative Photo-resist
To develop photoinitiator systems of high performance for the negative photo-resist, we synthesized six methoxyphenylquinoxalines (MOPQs) and investigated the photopolymerization of 2,2-bis(4-(acryloxypolyethoxy)phenyl)propane (A-BPE-10) initiated by these MOPQs in the negative photo-resist. MOPQs possess suitable UV-vis maximum absorption wavelengths in the range of 349-402 nm, along with high extinction coefficients ε. Except for T3MOP-DQ and T4MOP-DQ, the other four MOPQs, D3MOP-Q, D4MOP-Q, D3MOP-BenQ and D4MOP-BenQ, could initiate photopolymerization of A-BPE-10 in the negative photo-resist very efficiently. In particular, D3MOP-BenQ was the most efficient, with almost 100% final conversion in the presence of 2-mercaptobenzothiazole (MBO) as a coinitiator. Among the four coinitiators LCV, MBO, NPG and MDEA, MBO was the best coinitiator for MOPQs. The negative photo-resist containing MOPQs as a photoinitiator can also form good patterns on copper through photolithography. These characteristics make MOPQs potential photoinitiators in the negative photo-resist.
Lida Sun Xuesong Jiang Jie Yin
School of Chemistry and Chemical Technology, State Key Lab of Metal Matrix Composite, Shanghai Jiao School of Chemistry and Chemical Technology, State Key Lab of Metal Matrix Composite, Shanghai Jiao
国际会议
The 31st International Congress on Imaging Science(第31届国际影像科学大会 ICIS2010)
北京
英文
349-352
2010-05-12（万方平台首次上网日期，不代表论文的发表时间）