Molecular Glass Materials for UV Positive Photoresist
(0) Recent years increasing attention has been given to molecular glass resist materials. In this paper, maleopimaric acid, cycloaddition reaction product of rosin with maleic anhydride, was reacted with hydroxylamine and then further esterified with 2-diazo-1-naphthoquinone-4-sulfonyl chloride to give N-hydroxy maleopimarimide sulfonate. The carboxylic acid group of the compound was then esterified by the reaction of this compound with vinyl ethyl ether and dihydropyran. Thus obtained compounds were amorphous and have high Tg. When irradiated with i-line light, the 2,1,4-DNQ group undergo photolysis not only to give off nitrogen gas but also generate sulfonic acid which can result in the decomposition of the ester acetal groups at room temperature or moderately heated. So, a novel chemically amplified positive i-line molecular glass photoresists can be formed by the compounds. The lithographic performance of the resist materials is being evaluated.
Jinxing Yu Na Xu Liyuan Wang
College of Chemistry, Beijing Normal University, Beijing 100875, P.R.China
国际会议
The 31st International Congress on Imaging Science(第31届国际影像科学大会 ICIS2010)
北京
英文
390-393
2010-05-12（万方平台首次上网日期，不代表论文的发表时间）