Synthesis of Novel Prepolymers for Aqueous Alkalisoluble Negative Photoresist
An alkali-soluble photosensitive acrylic prepolymer was synthesized by two-steps grafting method. First, an acrylate polymer S-PSBMHA containing carboxyl groups was synthesized by esterification reaction of anhydride with OH groups of copolymer PSBMHA, which was synthesized with vinyl monomers by free radical polymerization. Then the photosensitive groups were introduced by the ring-opening reaction of epoxy groups of Glycidyl methacrylate（GMA）with carboxyl groups of S-PSBMHA to obtain G-S-PSBMHA prepolymer. The prepolymer was characterized by IR, 1H-NMR, GPC and DSC. The effects of molecular weight, double bond equivalent (DB equivalent), and acid value of acrylate prepolymers on the acid resistance, developability, and film-stripping time of the negative-type photoresists are studied in this paper. The research results show that when the acrylate prepolymer molecular weight is 2.00×104~2.50×104 g/mol, the DB equivalent is 1400 g/DB, acid value is 88 mgKOH/g and glass-transition temperature (Tg) is 57 ℃, the prepared photoresist exhibits best properties. For example, the adhesion of the film on copper-clad plate can reach 0~1 grade; there are no obvious changes when soaked in 10% (vol.) HCl solution at 60 ℃ for 2h; the film-stripping time in 3% (wt.) NaOH solution is just 30s~50s; and the resolution of the patterns based on the negative-type photoresist can reach the level of 25μm.
Chen Ning Liu Ren Liu Pengfei Xun Chun Zhang Shengwen Liu Xiaoya
School of Chemical and Engineering, Jiangnan University Wuxi, Jiangsu Province, P.R.China School of Chemical and Engineering, Jiangnan University Wuxi, Jiangsu Province, P.R.China
国际会议
The 31st International Congress on Imaging Science(第31届国际影像科学大会 ICIS2010)
北京
英文
654-657
2010-05-12（万方平台首次上网日期，不代表论文的发表时间）