Electroless deposition of W-doped Ag films onto p-Si(100) from diluted HF solution
Tungsten-doped silver films were prepared by immersing hydrogen-terminated silicon wafers into the solution of 2.5 mmol/L Ag2WO4+0.1 mol/L HF at 50 ℃.Their growth and composition were characterized with atomic force microscopy and X-ray photoelectron spectroscopy,respectively.The effect of tungstate ions on the deposition of silver was investigated by X-ray diffraction (XRD) and scanning electron microscopy (SEM) by comparing W-doped Ag film with Ag film.It is found that the molar fraction of tungsten in the deposits is about 2.3% and the O to W molar ratio was about 4.0 and W-doped Ag films have good anti-corrosion in air at 350 ℃.The doping of tungsten cannot change the deposition of silver.
autocatalytic electroless deposition W-doped Ag film silicon HF
YE Wei-chun MA Chuan-li WANG Chun-ming ZHOU Feng
State Key Laboratory of Solid Lubrication,Lanzhou Institute of Chemical Physics,Chinese Academy of S Department of Chemistry,Lanzhou University,Lanzhou 730000,China
国际会议
2009 Frontier Symposium of China Postductors on Materrials Science(2009年中国博士后材料科学前言论坛)
长沙
英文
1474-1478
2009-11-22（万方平台首次上网日期，不代表论文的发表时间）