FEM Applied to Evaluate Composite Hardness of SiO2 Film/316 LSS Substrate System
Due to non-ideal tip, performance of instrument and substrate effect, it is difficult to evaluate either composite mechanical properties of thin film/substrate system or the pure films properties. In order to get composite hardness of thin film and how the substrate takes effect of the films properties, FEM is used to simulate the indentation process of SiO2 thin films on 316LSS. With experiments, we observe that the hardness heavily depends the thickness of SiO2 film with different thickness deposited on 316 LSS by PVD. By FEM simulation and calculation, composite hardness is found to decrease greatly with increasing indentation depth. As thickness of film keeps constant, there exists a critical indentation depth about 1/20 of film thickness, less than which composite hardness may be regarded as film hardness. Discussion indicates FEM analysis method in this paper may not only play role in determining composite hardness of thin film/hardness system, but also provide a method to calculate pure hardness of thin film.
H R Wang Z D Jiang X Y Zhou Y Zhang
Institute of Precision Engineering, Xian Jiaotong University, Xian, China
国际会议
第四届仪器科学与技术国际会议( 4th International Symposium on Instrumentation and Science and Tcchnology)
哈尔滨
英文
1090-1095
2006-08-08（万方平台首次上网日期，不代表论文的发表时间）