Fabricating Arrays of Si(110)/Si(100) Microstructures by Atom Lithography using Organosilane Self-assembled Monolayers
(0) We reported a monolayer-derived fabrication of Si (110)/Si(100) microstructures arrays over an area of about 2 cm2 by atom lithography, in which selfassembled monolayer (SAM) of organosilane (octadecyltrichlorosilane, ODTS; dodecyltrichlorosilane, DDTS) and metastable helium beam (He-MAB) were used to pattern the surface of silicon substrates without coating intermediate layer. ODTS and DDTS SAMs were formed on Si(110)/Si (100) surfaces as resists for exposure to MAB. The hydrophobicity and the durability of the outermost surface of the SAM in the regions exposed to MAB were altered by varying MAB dose of exposure and the length of alkyl chains of SAM molecule. The negative/positive patterns of Si(110)/Si(100) surfaces with depths of 10～220nm and edge step resolutions of 40～500nm were obtained successfully. The effect of a wet etching process on the resolutions was discussed in brief. Our results suggested that the top-down atom lithography combined with bottom-up chemical assembly techniques could contribute significantly to the development of more monolayer-derived micro- and nanofabrication.
JW Zhang
Department of Physics,University of Science and Technology of China,Hefei,Anhui230026,P.R.China
国际会议
The 8th China International Nanoscience and Technology Symposium(2009第八届中国国际纳米科技湘潭研讨会Cinsts09)
湖南湘潭
英文
1-9
2009-10-23（万方平台首次上网日期，不代表论文的发表时间）