Effect of Al on properties of Mg2-z Alz Ni thin film hydride electrodes
Thin films of Mg_2xAl_xNi alloys have been prepared by magnetron sputtering,and the effects of partial substitution of Al for Mg on the charge-discharge properties of the films were studied. The results showed that the discharge property of Mg2Ni film was im proved by the partial substitution of Al for Mg. The maximum capacity was achieved in Mg_1.8Al0.2Ni with a 1.4 mAh/cm2·μm value. The mechanism was analyzed for the effect of Al addition to the electrode properties of Mg2Ni.
hydrogen storage alloy thin film Mg2Ni Al partial substitution charge-discharge property
XU Junli LI Ying WANG Fuhui
College of Science,Northeastern University,Shenyang 110004,China State Key Laboratory for Corrosion and Protection,Institute of Metal Research,Chinese Academy of Sci State Key Laboratory for Corrosion and Protection,Institute of Metal esearch,Chinese Academy of Scie
国际会议
The 10th China-Russia System on Advanced Materials and Technologies(第十届中俄新材料新工艺研讨会)
浙江嘉兴
英文
371-374
2009-10-20(万方平台首次上网日期,不代表论文的发表时间)