Research on microstructure and tezture of high pure titanium used for semiconductor manufacturing

摘要：

High pure titanium sputtering target is an important thin film material for preparation of diffusion barrier layer in IC manufac turing.Grain size and orientation are the main indicators of measuring the quality of titanium sputtering target.Cold rolling process and annealing process of 99.995% titanium material were studied by using OM,XRD,ODF analysis methods in this paper.It was found the most important processing parameters for refine high purity titanium were deformation amount and annealing temperature. The evenly dis tributed equiaxed grain with high stability can be obtained.Considering the effect of grain orientation on sputtering quality of titanium tar get,a certain proportion of rolling texture and annealing texture were formed under optimized process.

关键词： high pure titanium rolling grain size tezture ODF

作者: HE Jinjiang WANG Yonghui WANG Xinping XIONG Xiaodong

作者单位: GRIKIN Advanced Materials Co.Ltd,Beijing General Research Institute of Non-Ferrous Metals,Beijing 102200,China

会议类型: 国际会议

会议名称: The 10th China-Russia System on Advanced Materials and Technologies(第十届中俄新材料新工艺研讨会)

会议地点: 浙江嘉兴

会议语种:英文

页码: 480-483

在线出版日期: 2009-10-20（万方平台首次上网日期，不代表论文的发表时间）