Electrodeposition mechanisms of B(Ⅲ) and Ti(Ⅳ) on tungsten electrode in KF-KCl melts

摘要：

The mechanisms of B(HI) and Ti(IV) electrodeposition in molten fluorochloride melts were studied using electrochemical techniques at a temperature of 700℃in a three-electrode electrochemical cell.Voltammograms showed that the deposition of B(Ⅲ) is ob tained from the one-step reduction;B3+ +3e-B,and the reduction of Ti(Ⅳ) occurred in a three-step reaction including Ti4+ +e- Ti3+,Ti3 *+e-Ti2+ and Ti2++ 2e-Ti,similar to that obtained in all-fluoride melts. Their current-time characteristics of nucleation on tungsten electrodes showed a strong dependency on overpotentials.Chronoamperometry analysis showed that the deposition processes of Ti(IV) were controlled by an instantaneous nucleation with hemispherical diffusion-controlled growth.

关键词： electrodeposition mechanisms boron and titanium tungsten electrode fluorochloride melts

作者: WANG Zhaowen BAN Yungang SHI Zhongning GAO Bingliang HU Xianwei KAN Hongmin LUO Xudong

作者单位: School of Materials and Metallurgy,Northeastern University,Shenyang 110004,China Northeastern University Engineering & Research Institute Co.,Ltd.,Shenyang 110004,China Shenyang University,Shenyang 110044,China

会议类型: 国际会议

会议名称: The 10th China-Russia System on Advanced Materials and Technologies(第十届中俄新材料新工艺研讨会)

会议地点: 浙江嘉兴

会议语种:英文

页码: 751-756

在线出版日期: 2009-10-20（万方平台首次上网日期，不代表论文的发表时间）