Effects of K-rich in the Targets and Fabrication Parameters on 0.95(K0.48Na0.52NbO3)-0.05(LiSbO3) Films by Pulsed Deposition

摘要：

0.95(K0.48Na0.52NbO3)-0.05(LiSbO3) (95KNN-5LS) thin films have been fabricated by pulsed laser deposition (PLD) on Pt/Ti/SiO2/Si substrates. The K-rich in the target and the fabrication parameters on the properties of the films was investigated. The results show that good films can be obtained with the 0.95(K0.48Na0.52NbO3)-0.05(LiSbO3)-0.0228K2CO3 (95KNN-5LS-4.56K) target, and the surface roughness, film orientation, composition and properties of the films are strongly dependent on the oxygen pressure and oblique angle from the plume axial direction in PLD process.

关键词： 0.95(K0.48Na0.52NbO3)-0.05(LiSbO3) pulsed laser deposition (PLD) thin films

作者: L. Lu D.Q. Xiao Y. Sun Y.B. Zhang J.G. Zhu Y. Liu

作者单位: College of Materials Science and Engineering,Sichuan University,Chengdu 610064,China China Academy o College of Materials Science and Engineering,Sichuan University,Chengdu 610064,China China Academy of Engineer Physics,Mianyang 621900,China

会议类型: 国际会议

会议名称: 2009 The 18th IEEE International Symposium on Applications of Ferroelectrics(2009年国际铁电学暨IEEE国际铁电应用联合会议)

会议地点: 西安

会议语种:英文

页码: 206-209

在线出版日期: 2009-08-23（万方平台首次上网日期，不代表论文的发表时间）