Effect of Two-Steps RTA on the Properties of PSTT5 Thin Films
0.95Pb(Sc0.5Ta0.5)O3-0.05PbTiO3 (PSTT5) ferroelectric thin films have been prepared by RF magnetron sputtering on LSCO/Pt/Ti/SiO2/Si(100) substrates. A new two-steps rapid thermal annealing (TSRTA) was developed. TSRTA and conventional rapid thermal annealing (CRTA) were both used to anneal PSTT5 thin films. The XRD patterns shows that the PSTT5 thin films annealed by TSRTA would form pure perovskite structure and show highly (220) oriented. The ferroelectric measurements indicate that the PSTT5 thin films annealed by TSRTA possess better ferroelectric property. The 2Pr of the PSTT5 thin films annealed by TSRTA can be 25.4μC/cm2.
RF magnetron sputtering PSTT5 thin films RTA
Yucheng Sun Xuedong Li Yuanyuan Zhou Haimin Li Jiliang Zhu Hong Liu Ying Pei Dingquan Xiao Jianguo Zhu
College of Materials Science and Engineering,Sichuan University,Chengdu 610064,China College of Materials Science and Engineering,Sichuan University,Chengdu 610064,China Department of P
国际会议
西安
英文
210-213
2009-08-23(万方平台首次上网日期,不代表论文的发表时间)