PREPARATION OF K3Li2Nb5O15 THIN FILMS

摘要：

The c-axis oriented K3Li2Nb5O15 (KLN) tungsten-bronze thin films have been grown on LaNiO3/Si substrates by RF planar magnetron sputtering. The target used in this study is prepared by sintering pressed powder with potassium and lithium enriched composition, 33mole% K2CO3, 22mole% Li2CO3 and 45 mole% Nb2O5. The optimum sputtering conditions for growing tungsten-bronze structure films are an Ar atmosphere, 1.5Pa, 100W RF power and 400℃ substrate temperature. Dielectric properties of KLN films are as follows: Curie temperature of 465℃ and the dielectric constant of 91 at room temperature.

作者: Masatoshi Adachi Y. Aoyama Tomoaki Karaki Lihui Yang Genshui WANG Xianlin DONG

作者单位: Department of Intelligent Systems Design Engineering,Faculty of Engineering,Toyama Prefectural Unive Shanghai Institute of Ceramics,Chinese Academy of Sciences 1295 Dingxi Road,Shanghai 200050,China

会议类型: 国际会议

会议名称: 2009 The 18th IEEE International Symposium on Applications of Ferroelectrics(2009年国际铁电学暨IEEE国际铁电应用联合会议)

会议地点: 西安

会议语种:英文

页码: 367-369

在线出版日期: 2009-08-23（万方平台首次上网日期，不代表论文的发表时间）