NANOLITHOGRAPHY MADE ON STRUCTURE-TUNED BLOCK COPOLYMER FILM BY USING AFM TIP AS NANO-HAMMER
Introduction: The use of AFM tip for nanolithography 1,2 has shown itself to be a unique tool for materials structuring and patterning with nanometer precision. The techniques can be classified into two categories in terms of their operation principles:3 a) forceassisted AFM nanolithography; b) bias-assisted AFM nanolithography. Despite much progress has been made in this field, there are still a lot of problems4 related to resolution, speed, cost, and smear etc. to be solved. We introduce in this paper the AFM tip hammering nanolithography we have developed using conventional AFM instrumentation to generate both embossed and imprint patterns on the surface of a structure-tuned poly(styrene-ethylene /butylenesstyrene) (SEBS) block copolymer film with sub-20 run linewidth resolution.
Xiaodong Hong You Wang Baoquan Liu
Materials Physics and Chemistry Department,Harbin Institute of Technology,Harbin,150001 Materials Physics and Chemistry Department,Harbin Institute of Technology,Harbin,150001 Micro/Nano T
国际会议
International Symposium on Polymer Physics(2008年国际高分子物理学术会议PP2008)
厦门
英文
255-256
2008-06-08（万方平台首次上网日期，不代表论文的发表时间）