Application of Laser Plasma Source with a Gas-puff Target in Calibration of Eztreme Ultraviolet Detectors

摘要：

The paper presents a laser plasma source with a gas pu?target as a metrology tool for EUV technology. The investigations of the source are described. The spectrum emitted from the source and the conversion efficiency (CE) was measured. The results give an opportunity to design a procedure for a calibration of detectors for extreme ultraviolet. The special laboratory setup was developed based on the procedure. The setup is characterized by very low outlay and good metrology features as well. Compared to currently used systems, this setup can be applied in small factories and laboratories producing for instance EUV detectors.

作者: J.Mikolajczyk R.Rakowski

作者单位: Institute of Optoelectronics,Military University of Technology 2 Kaliskiego Str.,00-908 Warsaw,Poland

会议类型: 国际会议

会议名称: Progress in Electromagnetics Research Symposium 2009(2009年电磁学研究新进展学术研讨会)(PIERS 2009)

会议地点: 北京

会议语种:英文

页码: 1055-1058

在线出版日期: 2009-03-23（万方平台首次上网日期，不代表论文的发表时间）