Metrology Requirements for the 32 nm Technology Node and Beyond
Successful in-line metrology is imperative for a fab to achieve profitable production yields. Full functionality and high circuit speed are achieved only through control of defectivity and tight distributions of feature sizes. In-line monitoring of applicable metrics is key to ensuring success and is also used to fine-tune production processes for improved yield and circuit speed. Metrology has now become an inherent part of mission-critical production processes. This article gives a high-level overview of the findings of the ISMI metrology program and details some of the major approaching manufacturing challenges.
John Allgair Benjamin Bunday Aaron Cordes Pete Lipscomb Milt Godwin Victor Vartanian Michael Bishop Doron Arazi Kye-Weon Kim
International SEMATECH Manufacturing Initiative (ISMI)/AMD assignee ISMI ISMI/Spansion ISMI/Samsung
国际会议
上海
英文
151-160
2009-03-19（万方平台首次上网日期，不代表论文的发表时间）