High-Accuracy Measurement of Coma with the Optimized Alternating Phase-Shifting Mask with a Specific Phase Width

摘要：

The correlation between the coma sensitivity of the Alternating Phase-Shifting Mask (Alt-PSM) and the Alt-PSMs structure is studied. It is found that an optimized Alt-PSM whose phase width is two thirds of its pitch has a higher sensitivity to coma than Alt-PSMs with the same pitch and the different phase widths, when the pitch of the Alt-PSM makes only 1 ± and 3 ± orders diffraction light enter the lens pupil. The optimized Alt-PSM is used as a measurement mark to retrieve coma aberration from the projection optics in lithographic tools. In comparison with an ordinary Alt-PSM mark whose phase width is one half of its pitch, the measurement accuracies of Z7 and Z14have increased by 15％ and 31％ respectively.

作者: Zicheng Qiu Xiangzhao Wang Qiongyan Yuan Fan Wang

作者单位: Information Optics Laboratory,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sci National Engineering Research Center for Lithographic Equipment,Shanghai 201203,China

会议类型: 国际会议

会议名称: ISTC/CSTIC2009中国国际半导体技术研讨会

会议地点: 上海

会议语种:英文

页码: 381-390

在线出版日期: 2009-03-19（万方平台首次上网日期，不代表论文的发表时间）