Design of nano-lithographic system based on phase photon sieve
A nano-lithographic system based on phase photon sieve is proposed in this paper to overcome the disadvantages of zone plate array lithographic system and amplitude photon sieve lithographic system. As an important part of the system performance, the resolution of this system is mainly decided by the diffractive element. The phase photon sieve was used as the diffractive element in the proposed system. The structure and performance of the phase photon sieve is therefore very important to the resolution of this system. So, two methods are proposed for the designs and fabrication of the lithographic system based on phase photon sieve. The feasibility of using this system to realize nano-lithography with a resolution is of less than 100nm was then discussed. It is shown through analysis that the system not only has higher resolution and image contrast than the zone plate array lithographic system but also has higher diffractive efficiency than the amplitude photon sieve lithographic system. As a novel lithographic technique, the phase photon sieve lithographic system also offers new opportunities for high resolution X-ray microscopy and spectroscopy in physical and life sciences.
zone plate array lithography (ZPAL) amplitude photon sieve lithography (APSL) phase photon sieve lithography (PPSL) diffractive element design and fabrication method nano-lithographic
Wenbo Jiang Song Hu
Institute of Optics & Electronics, Chinese Academy of Science, Chengdu,610209,China Graduate School Institute of Optics & Electronics, Chinese Academy of Science, Chengdu,610209,China
国际会议
第五届仪器科学与技术国际学术会议(ISIST 2008)Fifth International Symposium on Instrmentation Science and Technology
沈阳
英文
1-6
2008-09-15（万方平台首次上网日期，不代表论文的发表时间）