Tungsten ozide nanostructure growth in HFCVD system by slow positron beam

摘要：

Tungsten oxide (WOx) nanostructure were prepared by a hot filament chemical vapor deposition (HFCVD) system and the temperature of the hot tungsten filaments were varied from 1350 ℃ to 2100 ℃ at the interval of 200 ℃ or 150 ℃. The morphology and average growth rate were indicated by scanning electron microscopy which showed that the morphology was highly related to filaments temperature (Tf) and the distance between filaments and Si (100) polished substrates (df). The influence of Tf on the crystalline nature was studied by X-ray diffraction and Raman spectra. The changes of stoichiometry and defects were confirmed by X-ray spectroscopy and slow positron beam system. When Tf was up to 1750 ℃, tungsten oxide nanostructure was synthesized. As Tf increased to 2100 ℃ and df decreased, the film crystallinity decreased, relatively the component ratio of stoichiometry WO3 decreased.

作者: J.Lou Z.B.Wang H.M.Weng H.J.Du B.J.Ye

作者单位: Department of modern Physics,University of Science and Technology of China,Hefei230026,P.R.China Department of Applied Chemistry,Harbin Institute of Technology,Harbin 150001,P.R.China

会议类型: 国际会议

会议名称: 第九届国际正电子与正电子素国际会议(9th International Workshop on Positron and Positronium Chemistry)(PPC–9)

会议地点: 武汉

会议语种:英文

页码: 98

在线出版日期: 2008-05-11（万方平台首次上网日期，不代表论文的发表时间）