会议专题

Studying Polyamide Water Separation Film Using Slow Positron Beam

Different polyamide water separation films were prepared by interfacial polymerization by using different concentrations of Ethylenediamine (EDA)/H2O and some Trimesoylchloride (TMC)/Toluene on the modified Polyacronitrile (mPAN) substrates. By applying a slow positron beam, depth profiles of relative free volume hole sizes for different films were obtained. It was found that the hole size at the skin polyamide layer was almost identical and much smaller than that in the mPAN substrate layer. The results indicate that the thickness of the polyamide layer is the major factor in controlling the performance of a membrane during water separation.

Polyamide separation film slow positron interfacial polymerization

Renwu Zhang Patrick Bell Justin R.Proirie Paul M.Johnson Lindsay A Everhart Y.C.Jean C.C.Hu

Physical Science Department,Southern Utah University,Cedar City,UT 84720 USA Department of Chemistry,University of Missouri-Kansas City,Kansas City,MO 64110 USA R & D Center for Membrane Technology,Chung Yuan Christian University,200 Chung Pei Rd.Chung Li,Taiwa

国际会议

第九届国际正电子与正电子素国际会议(9th International Workshop on Positron and Positronium Chemistry)(PPC–9)

武汉

英文

67-69

2008-05-11(万方平台首次上网日期,不代表论文的发表时间)