Study of the defect formation of helium in nanocrystalline titanium films

摘要：

In this paper, helium-charged nanocrystalline Ti films with different bias voltages were deposited by the He-Ar magnetron co-sputtering method. XRD was used to investigate the microstructure of the He-Ti film. Meanwhile, in order to find out the factors of affecting the growth and size of helium clusters, kinetic Monte Carlo (KMC) simulation was carried out to study the growth of helium cluster, based on the simulation of helium behavior in titanium using molecular dynamics.

关键词： titanium film microstructure helium cluster

作者: J.J.Long A.H.Deng Y.L.Zhou Q.Hou X.X.Yu J.Yu X.Cheng Y.J.Zhang L.Q.Shi

作者单位: Department of Applied Physics,Sichuan University,Chengdu 610065,P.R.China Institue of modern Physics,Fudan University,Shanghai 200433,P.R.China

会议类型: 国际会议

会议名称: 第九届国际正电子与正电子素国际会议(9th International Workshop on Positron and Positronium Chemistry)(PPC–9)

会议地点: 武汉

会议语种:英文

页码: 192-194

在线出版日期: 2008-05-11（万方平台首次上网日期，不代表论文的发表时间）