LARGE AREA NANOPATTERNING OF SILICON SURFACE BY CHEMICAL ASSISTED LASER PROCESSING USING NEAR-FIELD ENHANCEMENT BY PARTICLE-LENS ARRAYS
Nanopattering of silicon substrates using near-field enhancement by particle-lens arrays in a chemical solution is presented for the first time. Both experimental and theoretical investigations have been carried out to understand the properties of the nanopatterns produced. The obtained results proved that the developed nanofabrication technique is a flexible method for precise surface nanopatterning over large area surface. Novel nanostructures such as nano-bump and ring arrays, that previously not possible to be produed using the particle-lens arrays, have been demonstrated using this technique. A close-packed monolayer of SiO2 spheres (r=250 nm) was directly formed onto the silicon surface by self-assembly, and a 248nm wavelength KrF excimer laser was used to irradiate the samples. The theoretical modeling of the optical near-field is based on extended Mie theory. The effect of the laser fluence and assisted chemicals is studied. Due to the focusing of the particle lens, a reaction between the chemical solution and substrate can be induced in the locally high energy region. As a result, a lower laser fluence than the ablation threshold of bulk silicon can be used to generate nano-scale features.
Wei Guo Zeng Bo Wang Lin. Li Zhu Liu Boris Lukyanchuk David J. Whitehead
Laser Processing Research Centre, School of Mechanical, Aerospace and Civil Engineering, University Laser Processing Research Centre, School of Mechanical, Aerospace and Civil Engineering, University Corrosion and Protection Centre, School of Materials, University of Manchester, the Mill, Manchester Data Storage Institute, DSI Building, 5 Engineering Drive 1, Singapore 117608, Republic of Singapore
国际会议
第三届太平洋国际激光与光学应用会议(PICALO 2008)
北京
英文
669-672
2008-04-16（万方平台首次上网日期，不代表论文的发表时间）