Applications of Cladding Stress Induced Effects for Advanced Polarization Control in Silicon Photonics

摘要：

The applications of cladding stress in SOI waveguide components to enhance device functionality and improve fabrication tolerance are reviewed. Assisted by FEM design tools, characteristics of stress-induced effects are studied in depth. Design strategies are developed for using stress engineering to achieve a variety of functions. Polarization insensitive arrayed waveguide gratings (AWGs) and ring resonators, and polarization splitters and filters are demonstrated using these design principles.

作者: D.-X. Xu P. Cheben A. Del(a)ge S. Janz B. Lamontagne M.-J. Picard E. Post P. Waldron W. N. Ye

作者单位: Institute for Microstructural Sciences, National Research Council Canada (NRC) Ottawa, Ontario, Canada

会议类型: 国际会议

会议名称: Progress in Electromagnetics Research Symposium 2007(2007年电磁学研究新进展学术研讨会)(PIERS 2007)

会议地点: 北京

会议语种:英文

页码: 2157-2161

在线出版日期: 2007-03-26（万方平台首次上网日期，不代表论文的发表时间）