Nanolithography Structure Using Surface Plasmon Interference with a Planar Silver Lens

摘要：

A new nanolithgraphy structure using surface plasmon interference with a planar silver lens is introduced by attaching a silver film to the output surface of SPRINT structure. The silver film in this structure can effectively enhance the evanescent field generated by the interference of surface plasmon,which acts as a ‘perfect lens. It allows the large gap between the structure and the photoresist. The new structure not only inherits the merit of SPRINT,but also improves the tolerance of gap for the mechanical convenience.

作者: Xiaojin Jiao Pei Wang Douguo Zhang Ling Tang Hai Ming Jianping Xie

作者单位: University of Science and Technology of China,China

会议类型: 国际会议

会议名称: Progress in Electromagnetics Research Symposium 2005(2005年电磁学研究新进展学术研讨会)(PIERS 2005)

会议地点: 杭州

会议语种:英文

页码: 377-380

在线出版日期: 2005-08-22（万方平台首次上网日期，不代表论文的发表时间）