Compound Sacrificial Layer Process for RF MEMS Applications

摘要：

Compound sacrificial layer has been developed for RF membrane bridge switch in micro electro mechanical systems (MEMS) tunable filters. The compound sacrificial layer consisting of polyimide and positive photoresist is used to avoid drawbacks which will occur when only polyimide or positive photoresist is used as sacrificial layer for suspended membrane with large area. The wet etching and dry etching are used to remove positive photoresist and polyimide, respectively. And the results of baking and etching of sacrificial layer are improved. The time is also shortened for the complete removal of sacrificial layer.

关键词： MEMS RF switch compound sacrificial layer polyimide positive photoresist

作者: Yong-hua Zhang Chao Wang Wei-xia Ouyang Zong-sheng Lai

作者单位: Institute of Microelectronics Circuit & System, East China Normal University, Shanghai, China

会议类型: 国际会议

会议名称: 2009 3rd IEEE International Symposium on Microwave,Antenna,Progagation and EMC Technologies for Wireless Communications(第三届微波、天线、电波传播和EMC技术国际会议

会议地点: 北京

会议语种:英文

页码: 499-501

在线出版日期: 2009-10-27（万方平台首次上网日期，不代表论文的发表时间）