Plasma Based Ion Implantation and Deposition
Plasma based ion implantation and deposition (PBII&D) as a promising technique for surface modification of materials has been developed for about twenty years. The advantages of low processing temperature and no changes on surface roughness make it possible to improve surface properties such as wear resistance, corrosion resistance and fatigue strength of precision components. There are several working modes by using PBII&D, including ion implantation, magnetron sputter deposition, vacuum cathodic arc deposition, high pulsed-voltage discharge deposition, elevated temperature ion implantation, and hybrid processes using a combination of above methods. Materials such as steel, aluminum alloy and titanium alloy were surface modified by using above methods. Thin solid films such as DLC film, TiBCN film, a-F:C film, silver film, TiN film and multilayer films were prepared by using PBII&D. In addition, photocatalysis surface layers were also developed by this technique.
plasma based ion implantation and deposition surface modification
MA Xin-xin TANG Guang-ze SUN Ming-ren
School of Materials Science and Engineering,Harbin Institute of Technology,Harbin,150001,China
国际会议
The Fourth Asian Conference on Heat Treatment and Surface Engineering(第四届亚洲热处理及表面工程大会)
北京
英文
35-38
2009-10-27（万方平台首次上网日期，不代表论文的发表时间）