The Effects of Pressure and Temperature on Crystal Structure and Surface Morphology of TiO2 Films eposited by Sputtering

摘要：

Titania (TiO2) films were deposited by direct current magnetron sputtering. Varying the deposited pressure and temperature, TiO2 films with different crystalline structures and surface morphologies were obtained. Film growth rates were determined by X-ray reflection. X-ray diffraction spectra showed the TiO2 films mainly existed as amorphous structure at low pressure. And TiO2 films contained much more Ti crystalline structure when pressure was about 60 Pa. Characterization by atomic force microscopy revealed that the only when temperature was about 300℃, the surface morphologies of TiO2 films displayed obviously island structure and the RMS value increased abruptly, and reached the maximum 9.78 nm with 40 Pa., which meant the films contained more crystalline structures.

关键词： TiO2 magnetron sputtering crystalline structure

作者: Wanyu Ding Tomofuki.Nakano Dongying Ju Naoya Abe

作者单位: Department of Material Science and Engineering,Saitama Institute of echnology,Fukaya,369-0293,Japan Department of Material Science and Engineering,Saitama nstitute of Technology,Fukaya,369-0293,Japan Department of aterial cience and Engineering,Saitama Institute of Technology,Fukaya,369-0293,Japan Departmentof Material Science and Engineering,Saitama Institute of Technology,Fukaya,369-0293,Japan

会议类型: 国际会议

会议名称: The Fourth Asian Conference on Heat Treatment and Surface Engineering(第四届亚洲热处理及表面工程大会)

会议地点: 北京

会议语种:英文

页码: 482-485

在线出版日期: 2009-10-27（万方平台首次上网日期，不代表论文的发表时间）