Metal organic chemical vapor deposition of thin A12O3 films on HP40 alloy as ozidation barriers

摘要：

Amorphous alumina films were deposited by metal-organic chemical vapor deposition (MOCVD) on HP40 alloy.The deposition process was carried out in nitrogen with aluminum-tri-sec-butoxide (ATSB) as the precursor at atmospheric pressures.The effects of deposition temperature,growth rate and film thickness on the resistant corrosion properties have been investigated using optical microscopy (OM),scanning electron microscopy (SEM),X-ray diffraction (XRD) and atomic force microscopy (AFM).The results showed that alumina films deposited at 330℃ were smooth,uniform,and dense.

关键词： Mocvd A12O3 Growth rate Amorphous alumina films HP40 Ozidation barriers High-temperature corrosion Anti-corrosion

作者: Ergeng Zhang Zhirong Huang Qiongqi Wang Kaishu Guan

作者单位: School of Materials Science and Engineering ,East China University of Science and Technology,Shangha School of Mechanical and Power Engineering,East China University of Science and Technology,Shanghai

会议类型: 国际会议

会议名称: 国际断裂力学2009年会

会议地点: 成都

会议语种:英文

页码: 385-389

在线出版日期: 2009-10-16（万方平台首次上网日期，不代表论文的发表时间）