A New Integrated a-Si:H TFT Gate Driver with Q Node Quasi-Grounded
This paper presents a new integrated hydrogenated amorphous silicon thin film transistor (a-Si:H TFT) gate driver. It features a discharge circuit which connects the gate electrode (Q-node) of the driving TFT to ground during the low level holding period in the output of the driver. Simulation results indicate that the proposed gate driver effectively suppresses the noise voltage. The proposed gate driver with three stage units is fabricated and measured. The results show that the proposed gate driver is highly stable.
Integrated a-Si gate driver Stability TFT-LCD
Congwei Liaoa Changde He Yinan Liang Shengdong Zhang David Dai Smart Chung T.S.Jen
Shenzhen Graduate School, Peking University, Shenzhen 518055, PRC Institute of Jiangsu (IVO) FPD Technology & Research,InfoVision Optoelectronics (Kunshan) Co., Ltd, Institute of Jiangsu (IVO) FPD Technology & Research, InfoVision Optoelectronics (Kunshan) Co., Ltd,
国际会议
The 11th Asian Symposium on Information Display(ASID09)(第11届亚洲信息显示会议)
广州
英文
55-58
2009-10-07(万方平台首次上网日期,不代表论文的发表时间)