Preparation of Quartz Resonators with Pulse Magnetron Sputtering Technology

摘要：

On the Preparation of quartz crystal resonators to improve the traditional process, the use of alternative pulse magnetron sputtering vacuum evaporation technology, to achieve a rapid deposition of quartz chip aluminum electrode, under different process parameters of the deposition rate of Al film, by changing the process resonator parameters to control the main factors of the thickness of thin film metal electrode to achieve a resonant frequency of the precise control.

关键词： Quartz crystal resonator Pulse magnetron sputtering Sputtering Al films Deposition rate

作者: LIU Yan-tao MA Jian-ping

作者单位: Xian University of Technology, xian, 710048

会议类型: 国际会议

会议名称: 第九届真空冶金与表面工程学术会议

会议地点: 沈阳

会议语种:英文

页码: 287-291

在线出版日期: 2009-08-24（万方平台首次上网日期，不代表论文的发表时间）