The Role of Parameters in arc Deposition of ZrN films
Zirconium nitride (ZrN) films were deposited on Si and stainless steel substrates using multi-arc deposition methods. The effects of process parameters on the hardness have been investigated using Taguchi orthogonal experiment Substrate bias was found to be the effective parameters among the variables chosen. The role of substrate bias on the hardness could be summarized as: fine crystal strengthen, compressive residule stress, solid solution strengthening and hard prefered orientation. The effects of temperature, N2 flux and vacuum pressure and substrate-target orientation were also discussed.
arc deposition ZrN Taguchi orthogonal ezperiment bias voltage hardness
DU Jun ZHANG Ping CAI Zhi-hai ZHAO Jun-jun TIAN Fei
National Key Laboratory for Remanufacturing, Academy of Armored Force Engineering, Beijing 100072, China
国际会议
沈阳
英文
301-305
2009-08-24（万方平台首次上网日期，不代表论文的发表时间）