The Barrier Mechanism Research of The Ceramic Thin Film by Plasma Auziliary Magnetron Sputtering
SiOx films were deposited on the PET surface which enhances its barrier by plasma auxiliary magnetron sputtering in this article, and the mechanism of the barrier enhancement was researched, the supposition and the theoretical analysis to the SiOx films depositional appearance were made. At the same time, there are laminated structures, the random and distributional pinholes under the SEM appearance, which indicate the barrier enhancement may explained by Knudsen diffusion and Poiseuille flow, namely under certain pressure difference, the impediment enhancement decided by the pinhole distribution, ceramic level thickness as well as the quantities of SiOx layers.
Magnetron sputtering The ceramic thin film Knudsen diffusion Poiseuille flow
LIU Zhuang LIN Jing SUN Zhi-Hui
Harbin University of Commerce, Harbin 150028, China
国际会议
沈阳
英文
367-371
2009-08-24（万方平台首次上网日期，不代表论文的发表时间）