Process Optimization for UV Nanoimprint Lithography Using Elastic Mould
In order to tackle the demoulding and conglutinating problem with the resist and hard mold, a soft mould can be used in the nanoimprint lithography(NIL) process. In NIL process with elastic mould, a novel multi-step loading and demoulding process, called distortion reduction by pressure releasing (DRPR) is developed. This imprint process is continuous, the pressure releasing method, used to optimize the loading process, can reduce the distortions of soft imprint mould and wafer stage, while obtain better cavity filling and ultra thin & uniform residual layer, which is useful for the etching process and pattern transferring to the substrate. It is a novel and robust process with high fidelity of pattern replication in micro/nano structures fabrication, and the replication error caused by distortions can be reduced effectively.
imprint lithography pattern transfer elastic mould process optimization
Yan Le Chu Zhong Li hansong
School of Mechanical and Electrical Engineering, Beijing Information Science and Technology Universi School of Mechanical and Electrical Engineering, Qingdao University, Qingdao, Shandong, China, 26607 School of Mechanical and Electrical Engineering,Nanjing University of Aeronautics and Astronautics
国际会议
第八届国际测试技术研讨会(8th International Symposium on Test and Measurement)
重庆
英文
1812-1816
2009-08-01（万方平台首次上网日期，不代表论文的发表时间）