Feature Sensitive Bas Relief Generation

摘要：

Among all forms of sculpture, bas-relief is arguably the closest to painting. Although inherently a two dimensional sculpture, a bas-relief suggests a visual spatial extension of the scene in depth through the combination of composition, perspective, and shading. Most recently, there have been significant results on digital bas-relief generation but many of the existing techniques may wash out high level surface detail during the compression process. The primary goal of this work is to address the problem of fine features by tailoring a filtering technique that achieves good compression without compromising the quality of surface details. As a secondary application we explore the generation of artistic relief which mimic cubism in painting and we show how it could be used for generating Picasso like portraits.

关键词： shape deformation computer art sculpture tone mapping

作者: Jens Kerber Art Tevs Alexander Belyaev Rhaleb Zayer Hans-Peter Seidel

作者单位: MPI Informatik, Saarbrüucken, Germany Heriot-Watt University, Edinburgh, Scotland, UK INRIA, Nancy, France

会议类型: 国际会议

会议名称: IEEE International Conference on Shape Modeling and Applications (SMI)(2009年形状建模国际会议)

会议地点: 北京

会议语种:英文

页码: 148-154

在线出版日期: 2009-06-26（万方平台首次上网日期，不代表论文的发表时间）