Study on Ultra Precision Polishing of Single Crystal Diamond Substrates under Ultraviolet Irradiation

摘要：

The ultraviolet irradiation-assisted ultra precision polishing was performed on single crystal diamond substrates. This polishing method has been newly developed in our laboratory. The change of polishing performances was investigated by the presence of the UV irradiation. The polished surfaces were evaluated by the observation with WYKO. The experimental results are as follows; Surface roughness of diamond substrates polished under UV irradiation has become clearly smoother than that without UV irradiation. The surface roughness by this polishing method was reached to be 0.19 nm Ra on (100) surface of single crystal diamond. The equivalent surface was obtained on (110) surface by the UV-polishing.

关键词： ultra precision polishing single crystal diamond substance ultraviolet Irradiation.

作者: Satoru Anan Mutsumi Touge Akihisa Kubota Junji Watanabe

作者单位: Kumamoto University, 860-8555, Kurokami 2-39-1, Japan

会议类型: 国际会议

会议名称: 第九届加工技术进展国际会议(9th International Conference on Progress of Machining Technology)

会议地点: 昆明

会议语种:英文

页码: 335-358

在线出版日期: 2009-04-25（万方平台首次上网日期，不代表论文的发表时间）