Modeling Etching Plasmas: Needs and Challenges in Atomic and Molecular Data
This paper reviews works of the team to characterize and model chlorine high-density plasmas. The model allows in particular determining the pressure-dependence of the concentration of neutral and charged species. Comparison of this model to experimental measurements achieved in high-density surface-wave-produced plasmas shows an excellent agreement for the neutral atomic and molecular species. As far as charged species are concerned, the model reproduces well experiments for atomic chlorine ions and electrons, but some discrepancy occurs for molecular positive ions and negative ions at low pressure. The cause of this discrepancy remains to be clarified but might result from an underestimation of the creation rates of Cl2+ and Cl-, The model seems promising for predicting the ion density in a recently installed 1CP reactor.
high-density plasmas plasma processing molecular gases chlorine
J.Margot L.Stafford J.S.Poirier Pierre-Marc Berube M.Chaker
Groupe de physique des plasmas, Universite de Montreal, C.P.6128, Succ.Centre-ville, Montreal, Quebe INRS-Energie, Materiaux et Telecommunications, 1650 Boul.Lionel-Boulet, Varennes, Quebec, Canada J3X
国际会议
北京
英文
166-175
2008-10-27（万方平台首次上网日期，不代表论文的发表时间）