FABRICATION OF TWO-DIMENSIONAL PHOTONIC CRYSTALS WITH GE2SB2TE5 NANOHOLE ARRAYS BY NANOSPHERE LITHOGRAPHY
Two-dimensional photonic crystals (2D-PCs) with Ge2Sb2Te5 (GST) nanohole arrays were prepared by the nanosphere lithography (NSL) process. A primary factor of PCs is that the refractive index (n) and the n-modulation can be realized by using the GST films, which exhibit a reversible phase transformation between amorphous and crystalline states by laser illumination. The polystyrene (PS) spheres with a diameter of 500 nm were spin-coated on Si substrate and subsequently reduced by O_2-plasma treatment. The reduced spheres were utilized as a lift-off mask of the NSL process and their size and separation could be precisely controlled. Amorphous GST films were thermally evaporated and then the reduced PS spheres were removed. The fabricated GST nanohole arrays were observed by SEM and AFM. The nanohole diameters are nearly linearly reduced with increasing plasma-treatment time (t). The reduction rate (δ) for the conditions of this work was evaluated to be ～ 0.92 nm/s. The period (Λ) and filling factor (η) of PCs are structure parameters that determine their photonic bandgaps (PBGs). T|-modulation can be easily achieved via a control of t and the Λ can be also modulated by the use of PS spheres with specific diameter. In addition, the PBGs for the fabricated GST 2D PC were calculated by considering the amorphous and crystalline states of GST.
GeSbTe phase change nanosphere lithography photonic crystal photonic band gap
KI-HO SONG HYUN-YONG LEE HOE-YOUNG YANG SUNG-WON KIM JAE-HEE SEO SANG-DON YUN JUN-HYUNG KIM
Faculty of Applied Chemical Engineering, Chonnam National University, 300 Yongbong-dong Gwangju 500- Center for Functional Nano Fine Chemicals, Faculty of Applied Chemical Engineering, Chonnam National
国际会议
第五届先进材料与加工国际会议(Fifth International Conference on Advanced Materials and Processing ICAMP-5)
哈尔滨
英文
1300-1305
2008-09-03（万方平台首次上网日期，不代表论文的发表时间）