Optimization of nanoscale silicon waveguide fabrication

摘要：

A simple and effective technique was developed to improve the nanoscale silicon waveguide fabrication. 40 nanometer features with smooth and vertical sidewall are demonstrated. With this technique, nanoscale silicon grating coupler was obtained.

作者: Yao Chen Junbo Feng Zhiping Zhou Jun Yu Christopher J.Summers David S.Citrin

作者单位: Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, Department of Electronic Science & Technology, Huazhong University of Science and Technology, Wuhan, School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta Georgia 30332- School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta Georgia 3033

会议类型: 国际会议

会议名称: 2008亚洲光纤通讯与光电博览会暨国际会议(Asia Optical Fiber Communication & Optoelectronic Ezposition & Conference)

会议地点: 上海

会议语种:英文

页码: 1-3

在线出版日期: 2008-10-30（万方平台首次上网日期，不代表论文的发表时间）