Fabrication of optofluidic systems using isotropic wet etched masters in <111> silicon wafer

摘要：

Low roughness relief structures have been fabricated using wet etching in <111>silicon wafer for use as masters for microfluidic systems. The etch rate is about 1 to 3 mm/min. A surface roughness of about 2 nm was measured by the atomic force microscope (AFM). No distortion or variation on the channel width is observed in the circular and Y-branched relief structures.

作者: LIU Neng LI Ming-yu KOU Qing-li HE Jian-jun

作者单位: State Key laboratory for Modern Optical Instrumentation, Zhejiang University, Hangzhou 310027, China Laboratoire de Photophysique Moléculaire, CNRS-Université Paris-Sud , 91405 Orsay, France

会议类型: 国际会议

会议名称: 2008亚洲光纤通讯与光电博览会暨国际会议(Asia Optical Fiber Communication & Optoelectronic Ezposition & Conference)

会议地点: 上海

会议语种:英文

页码: 1-3

在线出版日期: 2008-10-30（万方平台首次上网日期，不代表论文的发表时间）