Physical and optical properties of ZnO thin films grown by DC sputtering deposition

摘要：

The effects of the deposition condition of DC sputtering on the properties of ZnO thin films were systematic investigated. ZnO films have been prepared by DC sputtering on the Si and glass substrates in the Ar and O2/Ar ambient with different substrate temperature ranging from room temperature to 300℃. Optimal results of the ZnO film were obtained with a deposition temperature of 300℃ in the O2/Ar ambient The film has a preferential orientation of (002) and the Zn to O ratio is stoichiometric with a strong band-edge emission in the ultraviolet region. All the films deposited on glass have an optical transmittance over 80 % in the wavelength ranging from 400nm to 800nm.

作者: Tao Chen Shu-Yi Liu Christophe Detavernier R.L.Van Meirhaeghe Xin-Ping Qu

作者单位: State key laboratory of Asic and system,Department of Microelectronics,Fudan University,Shanghai,200 Department of Solid State Science,Ghent University,Krijgslaan 281 /S1,B-9000 Ghent,Belgium

会议类型: 国际会议

会议名称: 9th International Conference on Solid-State and Integrated-Circuit Technology(第9届固态和集成电路国际会议)

会议地点: 北京

会议语种:英文

页码: 742-745

在线出版日期: 2008-10-20（万方平台首次上网日期，不代表论文的发表时间）