Development of novel SU-8 based nanoimprint lithography

摘要：

We present two kinds of novel nanoimprint lithography techniques based on SU-8 photoresist with single layer and tri-layer approaches. The imprint templates with high aspect ratio were first fabricated by electron beam lithography (EBL) and reactive ion etch (RIE),and then duplicated by the SU-8/SiO2/PMMA tri-layer technique we developed. Imprint properties such as pressure and temperature are determined to fabricate different nanostructures with various imprint depth. The developed processes,which provide us the capability to fabricate both imprinted nanostructures on resist and transferred nanopatterns on substrate with high volume and low cost,are further applied in producing high density gratings,planar chiral photonic metamaterials,and nanofluidics channels.

作者: Shen-Qi Xie Bing-Rui Lu Jing Wan Rong Yang Yifang Chen Xin-Ping Qu Ran Liu

作者单位: State key lab of Asic and system,Department of Microelectronics,Fudan University,Shanghai 200433,Chi Rutherford Appleton Laboratory,Chilton,Didcot,Oxon,OX11 0QX,UK

会议类型: 国际会议

会议名称: 9th International Conference on Solid-State and Integrated-Circuit Technology(第9届固态和集成电路国际会议)

会议地点: 北京

会议语种:英文

页码: 2476-2479

在线出版日期: 2008-10-20（万方平台首次上网日期，不代表论文的发表时间）