Fabrication of Nanostructured Titania Thin Film at Low Temperature

摘要：

Nanostructured Titania (NST) is attracting more and more attention due to its porousness and high surface to volume ratio. A novel process to fabricate integrated NST thin film at low temperature (80-90℃) is presented. NST features were formed by oxidizing Ti films in aqueous hydrogen peroxide. The optimal conditions of aqueous oxidation are: 85℃,.aqueous 10% H2O2 solution,20 min of water bath time. Crack-free NST features of 100μm×100μm were successfully fabricated. Two polymer masking materials,SU8 and Parylene,were proved to be compatible with this process,selective NST oxidation could be carried out at an ultra low temperature below 100℃.

关键词： NST Aqueous ozidation masking material

作者: Guanrong Tang Jing Chen

作者单位: Institute of Microelectronics,Peking University,Beijing 100871,P.R,China

会议类型: 国际会议

会议名称: 9th International Conference on Solid-State and Integrated-Circuit Technology(第9届固态和集成电路国际会议)

会议地点: 北京

会议语种:英文

页码: 2593-2596

在线出版日期: 2008-10-20（万方平台首次上网日期，不代表论文的发表时间）