Formation of micrometer-sized electrical contacts on light-emitting porous silicon films

摘要：

In the aqueous electrolyte of copper (Ⅱ) chloride, metallic conducting thin films have been electrochemically deposited onto the top surfaces of porous silicon (PS) films. Employing the scanning electron microscopy (SEM), we have investigated the surface morphology for an original PS film, a lightly deposited PS film and a heavily deposited PS film, respectively. On the basis of the SEM micrographs, the surface roughness of each PS film is quantitatively analyzed. Our results have demonstrated that the originally rough surfaces of PS films can be smoothed by the electrochemical deposition so that electrical contacts can be easily formed on PS films. On the smooth bed of copper microcrystals, both center-hollowed and center-solid equilateral triangles are observed in the sizes of several micrometers.

关键词： Porous silicon Electrical contact Electrochemical deposition Reduction

作者: Yuan Ming Huang Fu-fang Zhou Bao-gai Zhai Lan-li Chen

作者单位: College of Physics and Electronic Information, Yunnan Normal University, Kunming, Yunnan 650092, Chi Modern Educational Technology Center, Yunnan Normal University, Kunming, Yunnan 650092, China Department of Electronics, Nanyang Institute of Technology, Nanyang, Henan 473004, China

会议类型: 国际会议

会议名称: The 16th International Conference on Solid State Ionics(第十六届国际固态离子学会议)

会议地点: 上海

会议语种:英文

页码: 1194-1197

在线出版日期: 2007-07-01（万方平台首次上网日期，不代表论文的发表时间）