Nitrogen flow rate as a new key parameter for the nitridation of electrolyte thin films
This work presents an investigation of the role of the nitrogen flow rate on the composition, structure and ionic conductivity of thin films prepared by reactive radio-frequency (rf) sputtering of lithium metaborate targets. It was found that sputtering at constant nitrogen pressure but with increasing nitrogen flow rate leads to thin films with significantly increased nitrogen content. The effect of nitridation on the borate network has been studied by infrared transmittance spectroscopy and revealed boron-nitrogen bonding in triangular arrangements of the glass network, followed by a parallel destruction of borate tetrahedral units. The ionic conductivity of thin films was also measured and found to increase with the nitrogen amount in the film.
Nitridation Reactive sputtering Solid electrolyte Borate glasses
Y.Hamon P.Vinatier E.I.Kamitsos M.Dussauze C.P.E.Varsamis D.Zielniok C.Roesser B.Roling
ICMCB, CNRS, Universite de Bordeaux I, site de lENSCPB, 87 Av.Dr A.Schweitzer, 33608 Pessac Cedex, Theoretical and Physical Chemistry Institute, National Hellenic Research Foundation, 48 Vass.Constan Fachbereich Chemie, Philipps-Universitat Marburg, Hans-Meerwein Strasse, 35032 Marburg, Germany
国际会议
The 16th International Conference on Solid State Ionics(第十六届国际固态离子学会议)
上海
英文
1223-1226
2007-07-01（万方平台首次上网日期，不代表论文的发表时间）