The Structural and Optical Properties of High-Al-Content AlInGaN Epilayers grown by RF-MBE
AlInGaN Quaternary Alloys were successfully grown on sapphire substrate by radio-frequency plasma-excited molecular beam epitaxy (RF-MBE). Different Al content AlInGaN quaternary alloys were acquired by changing the Al cell’s temperature. The streaky RHEED pattern observed during AlInGaN growth showed the layer-by-layer growth mode. Rutherford back-scattering spectrometry (RBS), X-Ray diffraction (XRD) and Cathodoluminescence (CL) were used to characterize the structural and optical properties of the AlInGaN alloys. The experimental results show that the AlInGaN with appropriate Al cell’s temperature, could acquire Al/In ratio near 4.7, then could acquire better crystal and optical quality. The samllest X-ray and CL full-width at half-maximum (FWHM) of the AlInGaN are 5arcmin and 25nm, respectivly. There are some cracks and V-defects occur in high-Al/In-ratio AlInGaN alloys. In the CL image, the cracks and V-defect regions are the emission-enhanced regions. The emission enhancement of the cracked and V-defect regions may be related to the In-segregation.
AlInGaN ultraviolet MBE
Wang Baozhu An Tao Wen huanming Wu Ruihong An Shengbiao Zhang Xiuqing Wang Xiaoliang
Institute of Information Science and Engineering,Hebei University of Science and Technology,Shijiazh Institute of Information Science and Engineering,Hebei University of Science and Technology,Shijiazh Institute of Semiconductors,Chinese Academy of Sciences,Beijing China 100083
国际会议
2008亚太光通信会议(Asia-Pacific Optical Communications 2008)
杭州
英文
2008-10-26（万方平台首次上网日期，不代表论文的发表时间）